Fluid extraction system, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the e...

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Hauptverfasser: DE METSENAERE CHRISTOPHE, ROPS CORNELIUS MARIA, VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS, VAN DE WINKEL JIMMY MATHEUS WILHELMUS, RIEPEN MICHEL, BERKVENS PAUL PETRUS JOANNES, KEMPER NICOLAAS RUDOLF, VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS, VAN DEN HEUVEL MARTINUS WILHELMUS
Format: Patent
Sprache:eng
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Zusammenfassung:An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.