Memory with discrete storage elements

A method of making a non-volatile memory cell includes forming a plurality of discrete storage elements. A tensile dielectric layer is formed among the discrete storage elements and provides lateral tensile stress to the discrete storage elements. A gate is formed over the discrete storage elements.

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Hauptverfasser: WINSTEAD BRIAN A, LOIKO KONSTANTIN V, SHROFF MEHUL D
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Sprache:eng
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creator WINSTEAD BRIAN A
LOIKO KONSTANTIN V
SHROFF MEHUL D
description A method of making a non-volatile memory cell includes forming a plurality of discrete storage elements. A tensile dielectric layer is formed among the discrete storage elements and provides lateral tensile stress to the discrete storage elements. A gate is formed over the discrete storage elements.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US9202930B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US9202930B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US9202930B23</originalsourceid><addsrcrecordid>eNrjZFD1Tc3NL6pUKM8syVBIySxOLkotSVUoLskvSkxPVUjNSc1NzSsp5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBlkYGRpbGBk5GxkQoAQAQ-Scq</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Memory with discrete storage elements</title><source>esp@cenet</source><creator>WINSTEAD BRIAN A ; LOIKO KONSTANTIN V ; SHROFF MEHUL D</creator><creatorcontrib>WINSTEAD BRIAN A ; LOIKO KONSTANTIN V ; SHROFF MEHUL D</creatorcontrib><description>A method of making a non-volatile memory cell includes forming a plurality of discrete storage elements. A tensile dielectric layer is formed among the discrete storage elements and provides lateral tensile stress to the discrete storage elements. A gate is formed over the discrete storage elements.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INFORMATION STORAGE ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; STATIC STORES ; TRANSPORTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151201&amp;DB=EPODOC&amp;CC=US&amp;NR=9202930B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151201&amp;DB=EPODOC&amp;CC=US&amp;NR=9202930B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WINSTEAD BRIAN A</creatorcontrib><creatorcontrib>LOIKO KONSTANTIN V</creatorcontrib><creatorcontrib>SHROFF MEHUL D</creatorcontrib><title>Memory with discrete storage elements</title><description>A method of making a non-volatile memory cell includes forming a plurality of discrete storage elements. A tensile dielectric layer is formed among the discrete storage elements and provides lateral tensile stress to the discrete storage elements. A gate is formed over the discrete storage elements.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INFORMATION STORAGE</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>STATIC STORES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD1Tc3NL6pUKM8syVBIySxOLkotSVUoLskvSkxPVUjNSc1NzSsp5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBlkYGRpbGBk5GxkQoAQAQ-Scq</recordid><startdate>20151201</startdate><enddate>20151201</enddate><creator>WINSTEAD BRIAN A</creator><creator>LOIKO KONSTANTIN V</creator><creator>SHROFF MEHUL D</creator><scope>EVB</scope></search><sort><creationdate>20151201</creationdate><title>Memory with discrete storage elements</title><author>WINSTEAD BRIAN A ; LOIKO KONSTANTIN V ; SHROFF MEHUL D</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US9202930B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INFORMATION STORAGE</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>STATIC STORES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>WINSTEAD BRIAN A</creatorcontrib><creatorcontrib>LOIKO KONSTANTIN V</creatorcontrib><creatorcontrib>SHROFF MEHUL D</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WINSTEAD BRIAN A</au><au>LOIKO KONSTANTIN V</au><au>SHROFF MEHUL D</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Memory with discrete storage elements</title><date>2015-12-01</date><risdate>2015</risdate><abstract>A method of making a non-volatile memory cell includes forming a plurality of discrete storage elements. A tensile dielectric layer is formed among the discrete storage elements and provides lateral tensile stress to the discrete storage elements. A gate is formed over the discrete storage elements.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INFORMATION STORAGE
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
PERFORMING OPERATIONS
PHYSICS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
STATIC STORES
TRANSPORTING
title Memory with discrete storage elements
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-11T15%3A59%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WINSTEAD%20BRIAN%20A&rft.date=2015-12-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS9202930B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true