Low parasitic capacitance semiconductor device package

A semiconductor device package includes a substrate, a transistor, and a lead frame disposed on a side of the substrate opposite to the transistor. The transistor is disposed on the substrate, and includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating l...

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Hauptverfasser: LIAO WENIA, LIN LI-FAN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device package includes a substrate, a transistor, and a lead frame disposed on a side of the substrate opposite to the transistor. The transistor is disposed on the substrate, and includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, a first drain pad, a source plug, and a drain plug. The source and the drain electrodes are disposed on the active layer. An orthogonal projection of the source electrode on the active layer forms a source region. The first insulating layer covers at least a portion of the source electrode and at least a portion of the drain electrode. The first source pad and the first drain pad are disposed on the first insulating layer. An orthogonal projection of the first source pad on the active layer forms a source pad region overlaps the drain region.