Three dimensional semiconductor memory device and method of manufacturing the same

Provided is a three dimensional semiconductor device. The device may include mold layers vertically and sequentially stacked, a conductive pattern between the stacked mold layers, a plugging pattern vertically penetrating the stacked mold layers, an intermediate pattern between the conductive patter...

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Bibliographische Detailangaben
Hauptverfasser: KONG YOOCHUL, HWANG KIHYUN, YOO DONGCHUL, PARK CHANJIN, YANG JUNKYU, MIN GYUNGJIN, CHOI HANMEI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is a three dimensional semiconductor device. The device may include mold layers vertically and sequentially stacked, a conductive pattern between the stacked mold layers, a plugging pattern vertically penetrating the stacked mold layers, an intermediate pattern between the conductive pattern and the plugging pattern, and protective layer patterns between the mold layers and the plugging pattern, wherein the protective layer patterns are separated by the intermediate pattern.