Innovative approach of 4F2 driver formation for high-density RRAM and MRAM

Some embodiments of the present disclosure relate to a vertical MOSFET selection transistor that is configured to suppress leakage voltage in the memory cell without limiting the size of the memory cell. The memory selection transistor has a semiconductor body with first and second trenches that define a raised semiconductor structure having a source region, a channel region, and a drain region. A gate structure has a first gate electrode in the first trench, which extends vertically along a first side of the raised semiconductor structure, and a second gate electrode in the second trench, which extends vertically along an opposite, second side of the raised semiconductor structure. The first and second gate electrodes collectively control the flow of current between the source and drain region in the raised semiconductor structure. An electrical contact couples the drain region to a data storage element configured to store data.