Preparation, purification and use of high-X diblock copolymers

This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.

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Bibliographische Detailangaben
Hauptverfasser:	FARNHAM WILLIAM BROWN, SHEEHAN MICHAEL THOMAS, TRAN HOANG VI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.