Lithographic apparatus and contamination removal or prevention method

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentra...

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Bibliographische Detailangaben
Hauptverfasser:	WANTEN PETER FRANCISCUS, JANSEN HANS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, VAN DER NET ANTONIUS JOHANNUS, VAN DER DONCK JACQUES COR JOHAN, VAN DEN DOOL TEUNIS CORNELIS, CROMWIJK JAN WILLEM, LEENDERS MARTINUS HENDRIKUS ANTONIUS, SCHUH NADJA, WATSO ROBERT DOUGLAS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).