Method of making nozzle chip

A method of making a nozzle chip includes a step of reduction-projection-exposing a photosensitive resin material to exposure light through a mask by using a reduction-projection-exposure apparatus, the mask having a light-transmitting pattern formed thereon; and a step of forming an ejection orific...

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Bibliographische Detailangaben
Hauptverfasser:	KUROSU TOSHIAKI, WATANABE MAKOTO, MURAYAMA HIROYUKI, NAGAI MASATAKA, MANABE TAKANOBU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COMBINED OPERATIONS CORRECTION OF TYPOGRAPHICAL ERRORS ELECTROGRAPHY HOLOGRAPHY i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES MACHINE TOOLS MAKING FORGED OR PRESSED METAL PRODUCTS, e.g. HORSE-SHOES,RIVETS, BOLTS OR WHEELS MATERIALS THEREFOR MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL METAL-WORKING NOT OTHERWISE PROVIDED FOR ORIGINALS THEREFOR OTHER WORKING OF METAL PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PUNCHING METAL SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS UNIVERSAL MACHINE TOOLS WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS ORPROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL
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Beschreibung
Zusammenfassung:	A method of making a nozzle chip includes a step of reduction-projection-exposing a photosensitive resin material to exposure light through a mask by using a reduction-projection-exposure apparatus, the mask having a light-transmitting pattern formed thereon; and a step of forming an ejection orifice pattern corresponding to the light-transmitting pattern on the photosensitive resin material by performing a developing operation. The exposure light in the step of reduction-projection-exposing is passed through a correction mechanism before the exposure light reaches the photosensitive resin material, the correction mechanism being configured to suppress an inclination of a chief ray due to off-axis telecentricity that occurs in the reduction-projection-exposure apparatus.