Statistical analysis method and substrate process system
A data analyzing method includes receiving monitor data from the substrate processing apparatus; producing representative value data based on the monitor data; associating apparatus condition information indicating a condition of the substrate processing apparatus at the time of production of the mo...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A data analyzing method includes receiving monitor data from the substrate processing apparatus; producing representative value data based on the monitor data; associating apparatus condition information indicating a condition of the substrate processing apparatus at the time of production of the monitor data, with the representative value data; storing the representative value data and the apparatus condition information associated with the representative value data and in a database; retrieving the representative value data and the apparatus condition information associated with the representative value data from the database; comparing an exclusion parameter with the retrieved apparatus condition information, the exclusion parameter including information indicating whether the retrieved representative value data should be included in analysis processing targets; and determining whether the retrieved representative value data should be included in the analysis processing targets, based on the comparison result. |
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