Fit-to-pitch overlay measurement targets

Various target configurations are disclosed. A target may include multiple lines spaced equally apart according to a pitch distance. The target may also include a first mark having at least one edge parallel to the lines, wherein the edge is configured to have at least one of: a periodically repetit...

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Bibliographische Detailangaben
Hauptverfasser:	MANASSEN AMNON, LOEVSKY BARRY
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HANDLING RECORD CARRIERS IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Various target configurations are disclosed. A target may include multiple lines spaced equally apart according to a pitch distance. The target may also include a first mark having at least one edge parallel to the lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having an amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch. The target may further include a second mark having at least one edge parallel to the plurality of lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having a second amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch.