Copper residue chamber clean

Methods of removing copper residue from interior surfaces of an etch process chamber are described. A plasma treatment using halogen-containing precursors transforms the copper residue into halogen-copper complexes. Plasma-excited inert gases are used to desorb the halogen-copper complexes. In this...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JOSEPH ERIC, HOINKIS MARK, YAN CHUN, MIYAZOE HIROYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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