Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively...

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Hauptverfasser:	DE GRAAF ROELOF FREDERICK, SMEULERS JOHANNES PETRUS MARIA, VAN DER MEULEN FRITS, POLIZZI MARCO, HOOGENDAM CHRISTIAAN ALEXANDER, VAN DER TOORN JAN-GERARD CORNELIS, BELFROID STEFAN PHILIP CHRISTIAAN, TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA, TEN KATE NICOLAAS, MERTENS JEROEN JOHANNES SOPHIA MARIA, OTTENS JOOST JEROEN, KEMPER NICOLAAS RUDOLF, COX HENRIKUS HERMAN MARIE, DONDERS SJOERD NICOLAAS LAMBERTUS, VOGEL HERMAN, VAN GOMPEL EDWIN AUGUSTINUS MATHEUS, LEENDERS MARTINUS HENDRUKUS ANTONIUS, VERHAGEN MARTINUS CORNELIUS MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.