Method of and system for suppressing deposition of radioactive substance

A radioactive substance is effectively suppressed by an oxide-film removal step of removing an oxide film on a metallic material surface with which a coolant containing the radioactive substance comes in contact, and a titanium-oxide deposition step of depositing a titanium oxide on the metallic mat...

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Bibliographische Detailangaben
Hauptverfasser:	AOI HIROMI, FUKUMATSU TERUKI, URUMA YUTAKA, YAITA YUMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DECONTAMINATION ARRANGEMENTS THEREFOR DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NUCLEAR ENGINEERING NUCLEAR PHYSICS NUCLEAR REACTORS PHYSICS PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULARRADIATION OR PARTICLE BOMBARDMENT SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATING RADIOACTIVELY CONTAMINATED MATERIAL
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Beschreibung
Zusammenfassung:	A radioactive substance is effectively suppressed by an oxide-film removal step of removing an oxide film on a metallic material surface with which a coolant containing the radioactive substance comes in contact, and a titanium-oxide deposition step of depositing a titanium oxide on the metallic material surface after the oxide film has been removed.