Methods, systems, and articles of manufacture for implementing multiple-patterning-aware design rule check for electronic designs

Disclosed are methods, systems, and articles of manufactures for implementing multiple-patterning-aware design rule check for an electronic design. Various embodiments identify one or more sets of multiple-exposure grids and identify or generate a data structure by using the one or more sets of grid...

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Bibliographische Detailangaben
Hauptverfasser: GEROUSIS VASSILIOS, ZHANG SHUO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed are methods, systems, and articles of manufactures for implementing multiple-patterning-aware design rule check for an electronic design. Various embodiments identify one or more sets of multiple-exposure grids and identify or generate a data structure by using the one or more sets of grids to store design data of shape ends of various ends. Various embodiments perform constant time design rule checking by performing a constant time search process on the data structure to look up from the data structure one or more violations of one or more design rules which include at least one directional design rule. Some aspects are directed at fixing a design rule violation by using at least some grids of the one or more sets of grids.