Fabrication of on-product aberration monitors with nanomachining

A method of fabricating an aberration monitor on a production mask used in photolithographic patterning of a semiconductor substrate is provided. The method may include placing a production mask within a nanomachine repair tool and generating, using the nanomachine repair tool, a phase shifting patt...

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Bibliographische Detailangaben
1. Verfasser:	MCINTYRE GREGORY R
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method of fabricating an aberration monitor on a production mask used in photolithographic patterning of a semiconductor substrate is provided. The method may include placing a production mask within a nanomachine repair tool and generating, using the nanomachine repair tool, a phase shifting pattern within a region of the production mask.