Method and apparatus for controlling a processing system

Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure...

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Bibliographische Detailangaben
Hauptverfasser:	FISHER PAUL E, NEUBER ANDREAS, PUTZ JOSHUA, LOLDJ YOUSSEF, JUNG JAY J, MOALEM MEHRAN
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING HEATING LIGHTING MECHANICAL ENGINEERING NON-POSITIVE DISPLACEMENT PUMPS PIPE-LINE SYSTEMS PIPE-LINES POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS STORING OF DISTRIBUTING GASES OR LIQUIDS WEAPONS
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Beschreibung
Zusammenfassung:	Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.