Fabrication method for a chip package

An embodiment of the present invention relates to a chip package and fabrication method thereof, which includes a chip protection layer or an additional etching stop layer to cover conducting pads to prevent dicing residue from damaging or scratching the conducting pads. According to another embodim...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSAI CHIA-LUN, CHENG CHIA-MING, YEOU LONG-SHENG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An embodiment of the present invention relates to a chip package and fabrication method thereof, which includes a chip protection layer or an additional etching stop layer to cover conducting pads to prevent dicing residue from damaging or scratching the conducting pads. According to another embodiment, a chip protection layer, an additional etching stop layer formed thereon, or a metal etching stop layer level with conducting pads or combinations thereof may be used when etching an intermetal dielectric layer at a structural etching region and a silicon substrate to form an opening for subsequent semiconductor manufacturing processes.