Contact structure for a semiconductor device and methods of making same

A device includes first and second spaced-apart active regions positioned in a semiconducting substrate, an isolation region positioned between and separating the first and second spaced-apart active regions, and a layer of gate insulation material positioned on the first active region. A first conductive line feature extends continuously from the first active region and across the isolation region to the second active region, wherein the first conductive line feature includes a first portion that is positioned directly above the layer of gate insulation material positioned on the first active region and a second portion that conductively contacts the second active region.