Material deposition system and method for depositing materials on a substrate

A material deposition system includes a frame, a support coupled to the frame to support an electronic substrate during a deposit operation, a gantry coupled to the frame, and a deposition head coupled to the gantry. The deposition head is movable over the support by movement of the gantry. The depo...

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Bibliographische Detailangaben
Hauptverfasser: MOHANTY RITA, REID SCOTT A, TRACY ROBERT W, KARLINSKI THOMAS J, KWOK KUIIU, CROUCH KENNETH C
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A material deposition system includes a frame, a support coupled to the frame to support an electronic substrate during a deposit operation, a gantry coupled to the frame, and a deposition head coupled to the gantry. The deposition head is movable over the support by movement of the gantry. The deposition head includes a chamber to hold material, an actuator to push a volume of material out of the chamber, a needle extending from the chamber and terminating in a needle orifice, and at least two air jets located on opposite sides of the needle orifice. A desired volume of material is formed at the needle orifice in response to the actuator, and each of the at least two air jets produce a timed pulse of air to create a micro-droplet from the desired volume and to accelerate the micro-droplet to high velocity.