Lithographic apparatus

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the secon...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, BECKERS MARCEL, GROUWSTRA CÉDRIC DÉSIRÉ, VERHEES REMKO JAN PETER, VAN VLIET EVERT, MULKENS JOHANNES CATHARINUS HUBERTUS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MOERMAN RICHARD, EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA, MULDER PIETER, VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS, PHILIPS DANNY MARIA HUBERTUS, KOPPELAARS NICOLAAS FRANCISCUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.