Substrate treatment systems using supercritical fluid

Substrate treatment systems using supercritical fluid

Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercriti...

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Bibliographische Detailangaben
Hauptverfasser: LEE KUNTACK, CHO YONG-JHIN, KO YONGSUN, JUN YONGMYUNG, JANG WONHO, KIM SEOKHOON, OH JUNG-MIN, KIM KYOUNGSEOB, KIM KWANGSU
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.