Process chamber component having yttrium-aluminum coating

A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.

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Bibliographische Detailangaben
Hauptverfasser: HAN NIANCI, XU LI, SHIH HONG
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.