Metal implants

A metal implant for use in a surgical procedure is provided with a surface layer that is integral with the metal substrate, and which incorporates a biocidal material. The surface layer is grown by anodizing at a voltage between 50 and 150 V, and the biocidal material incorporated in it by ion excha...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TURNER ANDREW DEREK, PICKFORD MARTIN EDWARD LEE, LEWIS DAVID RICHARD
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A metal implant for use in a surgical procedure is provided with a surface layer that is integral with the metal substrate, and which incorporates a biocidal material. The surface layer is grown by anodizing at a voltage between 50 and 150 V, and the biocidal material incorporated in it by ion exchange. This produces a significantly harder surface than anodizing at low voltage, and generates pits containing ion-absorbing material.