Method of manufacturing semiconductor device

A method of manufacturing a semiconductor device includes the steps of preparing a semiconductor wafer having a thick portion in an outer circumferential end portion and a thin portion in a central portion, attaching a support material to one surface of the semiconductor wafer, dividing the semicond...

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Bibliographische Detailangaben
Hauptverfasser: NAKATA KAZUNARI, TERASAKI YOSHIAKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of manufacturing a semiconductor device includes the steps of preparing a semiconductor wafer having a thick portion in an outer circumferential end portion and a thin portion in a central portion, attaching a support material to one surface of the semiconductor wafer, dividing the semiconductor wafer into the thick portion and the thin portion, and cutting the thin portion, after the division, while supporting the thin portion by the support material.