Wet etch and clean chemistries for MoOx

A method of removing non-noble metal oxides from material (e.g., semiconductor material) used to make a microelectronic device includes providing the material comprising traces of the conducting non-noble metal oxides; applying a chemical mixture (or chemical solution) to the material; removing the traces of the non-noble metal oxides from the material; and removing the chemical mixture from the material. The non-noble metal oxides comprise MoOx, wherein x is a positive number between 0 and 3. The chemical solution comprises any one of HNO3-based chemicals, H2SO4-based chemicals, HCl-based chemicals, or NH4OH-based chemicals.