Method for determining a critical dimension at a plane of interest from a measurement taken at a test plane

A method for determining a critical dimension of a structure along a plane of interest from a measurement along a test plane that is not necessarily located at the plane of interest. The method involves slicing a structure along a test plane and measuring a marker feature in this test plane. A deter...

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Bibliographische Detailangaben
1. Verfasser:	CHIEN CHESTER X
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	A method for determining a critical dimension of a structure along a plane of interest from a measurement along a test plane that is not necessarily located at the plane of interest. The method involves slicing a structure along a test plane and measuring a marker feature in this test plane. A determination of a critical dimension of a feature at the plane of interest is then determined based on the measurement of the marker feature measurement at the test plane. This testing methodology can be useful, for example in the measurement of a critical dimension of a write pole at an air bearing surface plane form a measurement of a test feature at a plane that is not necessarily located at the air bearing surface plane.