Pellicle having buffer zone and photomask structure having pellicle

A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.

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Bibliographische Detailangaben
Hauptverfasser:	SHIN IN-KYUN, KIM SUNG-HYUCK, AN BUM-HYUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.