Aperture unit for a particle beam device
An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture ope...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening. |
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