Model-based metrology using tesselation-based discretization

Model-based metrology using tesselation-based discretization

A novel technique for model-based metrology. A geometry of structure to be measured on a surface of a substrate is received. A tessellation of the geometry of the structure is produced. The tessellation is used to determine a vertical discretization and a horizontal discretization so as to generate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HENCH JOHN J, VELDMAN ANDREI
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A novel technique for model-based metrology. A geometry of structure to be measured on a surface of a substrate is received. A tessellation of the geometry of the structure is produced. The tessellation is used to determine a vertical discretization and a horizontal discretization so as to generate a discrete model for the geometry, and scatterometry computations are performed using the discrete model. Other embodiments, aspects and features are also disclosed.