Sample preparation stage

Described is a system and method for in situ sample preparation and imaging. The system includes a multi-axis stage 100 having a bulk stage 110 and a grid stage 150 with various degrees of freedom to allow for sample preparation. In some embodiments, a focused ion beam system is used to prepare a la...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DEN BOOGAARD MATHIJS PETRUS WILHELMUS, PERSOON JOHANNES A. H. W. G, ENGELEN ANDREAS THEODORUS, HAYLES MICHAEL FREDERICK, SCHAMPERS RUDOLF JOHANNES PETER GERARDUS
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES IRRADIATION DEVICES MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TESTING
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Beschreibung
Zusammenfassung:	Described is a system and method for in situ sample preparation and imaging. The system includes a multi-axis stage 100 having a bulk stage 110 and a grid stage 150 with various degrees of freedom to allow for sample preparation. In some embodiments, a focused ion beam system is used to prepare a lamella on the bulk stage 110. The lamella can then be transferred to the grid stage 150 from the bulk stage 110 without needing to move the multi-axis stage 100 from the focused ion beam system.