Methods and structures for electrostatic discharge protection

A semiconductor device includes a first well region of a first conductivity type, a second well region of a second conductive type within the first well region. A first region of the first conductivity type and a second region of the second conductivity type are disposed within the second well regio...

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Bibliographische Detailangaben
Hauptverfasser: LU CHIA-LING, LIU YU-LIEN, WANG SHIH-YU, LU TAONG, CHEN YAN-YU
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device includes a first well region of a first conductivity type, a second well region of a second conductive type within the first well region. A first region of the first conductivity type and a second region of the second conductivity type are disposed within the second well region. A third region of the first conductivity type and a fourth region of the second conductivity type are disposed within the first well region, wherein the third region and the fourth region are separated by the second well region. The semiconductor device also includes a switch device coupled to the third region.