Inter connection structure including copper pad and pad barrier layer, semiconductor device and electronic apparatus including the same

A semiconductor device including an interconnection structure including a copper pad, a pad barrier layer and a metal redistribution layer, an interconnection structure thereof and methods of fabricating the same are provided. The semiconductor device includes a copper pad disposed on a first layer,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHIN CHANG-WOO, CHUNG HYUN-SOO, KIM JUM-GON, CHUN JIN-HO, AHN EUNUL
Format: Patent
Sprache:eng
Schlagworte:
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