System and method for deposition in high aspect ratio magnetic writer heads

Systems and methods for fabricating a microelectric device are provided herein. Various embodiments provide for systems and methods for fabricating a magnetic recording pole using plasma-enhanced chemical vapor deposition (PECVD) when depositing seed material. For some embodiments, fabrication of th...

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Bibliographische Detailangaben
Hauptverfasser:	SI WEIMIN, HONG YING, ZENG WANXUE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER METALLURGY PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Beschreibung
Zusammenfassung:	Systems and methods for fabricating a microelectric device are provided herein. Various embodiments provide for systems and methods for fabricating a magnetic recording pole using plasma-enhanced chemical vapor deposition (PECVD) when depositing seed material. For some embodiments, fabrication of the magnetic recording pole may comprise using plasma-enhanced chemical vapor deposition (PECVD) Ru as an adhesion layer for a plating seed layer.