Misalignment management

A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	MOKABERI BABAK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING WORKING CEMENT, CLAY, OR STONE
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Beschreibung
Zusammenfassung:	A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance.