Method of directional resistivity logging

A method for estimating at least one formation parameter from a directional resistivity measurement includes computing a plurality of hypothetical directional resistivity values at a corresponding plurality of formation parameter values. The computation makes use of a forward model having at least o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DONG QIUZHAO, WANG TSILI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method for estimating at least one formation parameter from a directional resistivity measurement includes computing a plurality of hypothetical directional resistivity values at a corresponding plurality of formation parameter values. The computation makes use of a forward model having at least one analytical expression that relates a directional resistivity measurement to the formation parameter. The analytical expression includes at least one image source term. Comparison of computed directional resistivity values with measured direct resistivity values enables a value of at least one formation parameter to be selected. The method may be implemented on a downhole processor.