Poly-oxycarbosilane compositions for use in imprint lithography

The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.

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Bibliographische Detailangaben
Hauptverfasser: DIPIETRO RICHARD ANTHONY, DUBOIS GERAUD JEAN-MICHEL, MILLER ROBERT DENNIS, SOORIYAKUMARAN RATNAM
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.