Decomposition/elimination method using a photocatalytic material

The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAYASU TERUKI, ARAI TERUO, ONODA KINJI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The decomposition method of the present invention using a photocatalytic material enables significantly efficient and rapid decomposition of hazardous substances in gas and/or liquid phases by causing a photocatalytic material to coexist with a dilute hydrogen peroxide solution.