Method and system for wafer level singulation

A method of singulating a plurality of semiconductor dies includes providing a carrier substrate and joining a semiconductor substrate to the carrier substrate. The semiconductor substrate includes a plurality of devices. The method also includes forming a mask layer on the semiconductor substrate,...

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Bibliographische Detailangaben
Hauptverfasser: BJORKMAN CLAES H, RAMASWAMI SESHADRI, SCHUEGRAF KLAUS, RICE MICHAEL R, SALEK MOHSEN S
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method of singulating a plurality of semiconductor dies includes providing a carrier substrate and joining a semiconductor substrate to the carrier substrate. The semiconductor substrate includes a plurality of devices. The method also includes forming a mask layer on the semiconductor substrate, exposing a predetermined portion of the mask layer to light, and processing the predetermined portion of the mask layer to form a predetermined mask pattern on the semiconductor substrate. The method further includes forming the plurality of semiconductor dies, each of the plurality of semiconductor dies being associated with the predetermined mask pattern and including one or more of the plurality of devices and separating the plurality of semiconductor dies from the carrier substrate.