Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium

A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to...

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Bibliographische Detailangaben
Hauptverfasser:	TAKIGUCHI YASUSHI, YOSHITAKA NAOTO, FUJIMOTO AKIHIRO, KUMAGAI DAI, NISHIKIDO SHUUICHI, YAMAMOTO TARO, TOKUNAGA YOICHI, KITANO TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.