Apparatus for forming a nanoscale semiconductor structure on a substrate by applying a carrier fluid

An apparatus applies a carrier fluid to a semiconductor substrate. The carrier fluid carries nanoparticles. The positions of a plurality of particles in the carrier fluid are manipulated by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ROENKKAE RISTO JOHANNES JOHANNES, KORPI PETRI JUHANI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus applies a carrier fluid to a semiconductor substrate. The carrier fluid carries nanoparticles. The positions of a plurality of particles in the carrier fluid are manipulated by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on the substrate, and sintering the nanoparticles to form a region.