Method and apparatus for angular-resolved spectroscopic lithography characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Hauptverfasser: VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, DUSA MIRCEA, KIERS ANTOINE GASTON MARIE, DEN BOEF ARIE JEFFREY MARIA, LUEHRMANN PAUL FRANK, VAN KRAAIJ MARKUS GERARDUS MARTINUS, BLEEKER ARNO JAN, GROUWSTRA CEDRIC DESIRE, PELLEMANS HENRICUS PETRUS MARIA, VAN DER SCHAAR MAURITS
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creator VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA
DUSA MIRCEA
KIERS ANTOINE GASTON MARIE
DEN BOEF ARIE JEFFREY MARIA
LUEHRMANN PAUL FRANK
VAN KRAAIJ MARKUS GERARDUS MARTINUS
BLEEKER ARNO JAN
GROUWSTRA CEDRIC DESIRE
PELLEMANS HENRICUS PETRUS MARIA
VAN DER SCHAAR MAURITS
description An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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subjects MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
title Method and apparatus for angular-resolved spectroscopic lithography characterization
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