Method and apparatus for angular-resolved spectroscopic lithography characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Hauptverfasser:	VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, DUSA MIRCEA, KIERS ANTOINE GASTON MARIE, DEN BOEF ARIE JEFFREY MARIA, LUEHRMANN PAUL FRANK, VAN KRAAIJ MARKUS GERARDUS MARTINUS, BLEEKER ARNO JAN, GROUWSTRA CEDRIC DESIRE, PELLEMANS HENRICUS PETRUS MARIA, VAN DER SCHAAR MAURITS
Format:	Patent
Sprache:	eng
Schlagworte:	MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.