Lithographic apparatus and contamination detection method

A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam t...

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Bibliographische Detailangaben
Hauptverfasser: MOORS JOHANNES HUBERTUS JOSEPHINA, STEVENS LUCAS HENRICUS JOHANNES, VEEFKIND ABRAHAM, BUSSINK PETER GERHARDUS WIHELMUS, BRUINSMA ANASTASIUS JACOBUS ANICETUS, BROUWER EGBERT ANNE MARTIJN
Format: Patent
Sprache:eng
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Zusammenfassung:A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.