Semiconductor structure and method for interconnection of integrated circuits

In one embodiment, an interposer resistant to warping is provided. The interposer includes a semiconductor body having a first contact array included on a first side of the semiconductor body. Vias are formed through the semiconductor body. One or more wiring layers are included on the first side of the semiconductor body. The wiring layers electrically couple each contact of the first contact array to a respective one of the vias. Contacts of a second contact array, included on a second side of the semiconductor body, are respectively coupled to the vias. A stabilization layer is included on the second side of the semiconductor body. The stabilization layer is configured to counteract stresses exerted on a front side of the interposer due to thermal expansion of wiring layers.