Template-registered diblock copolymer mask for MRAM device formation
A device comprising a diblock copolymer mask for fabricating a magnetoresistive random access memory (MRAM) includes a magnetic layer; a mask formed on the magnetic layer; a template formed on the mask; and the diblock copolymer mask, the diblock copolymer mask comprising a first plurality of unifor...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A device comprising a diblock copolymer mask for fabricating a magnetoresistive random access memory (MRAM) includes a magnetic layer; a mask formed on the magnetic layer; a template formed on the mask; and the diblock copolymer mask, the diblock copolymer mask comprising a first plurality of uniform shapes formed on and registered to the template. |
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