Methods, devices, and materials for metallization

A method of making an electronic device which in one embodiment comprises providing a substrate, electrolessly depositing a barrier metal at least on portions of the substrate, and using wet chemistry such as electroless deposition to deposit a substantially gold-free wetting layer having solder wet...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE WILLIAM T, KOLICS ARTUR, REDEKER FRITZ
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of making an electronic device which in one embodiment comprises providing a substrate, electrolessly depositing a barrier metal at least on portions of the substrate, and using wet chemistry such as electroless deposition to deposit a substantially gold-free wetting layer having solder wettability onto the barrier metal. An electronic device which in one embodiment comprises a metallization stack. The metallization stack comprises a barrier metal deposited electrolessly and a substantially gold-free wetting layer deposited on the barrier metal, and the wetting layer is wettable by solder.