Optical element and method

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

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Hauptverfasser: GRUNER TORALF, THIER MICHAEL, HAUF MARKUS, FOCHT GERHARD, TAYEBATI PAYAM, KAZI ARIF, EVA ERIC, SCHOENHOFF ULRICH, FLUEGGE OLE, SAUERHOEFER ALEXANDER, WEBER JOCHEN
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creator GRUNER TORALF
THIER MICHAEL
HAUF MARKUS
FOCHT GERHARD
TAYEBATI PAYAM
KAZI ARIF
EVA ERIC
SCHOENHOFF ULRICH
FLUEGGE OLE
SAUERHOEFER ALEXANDER
WEBER JOCHEN
description The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
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subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title Optical element and method
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