Optical element and method
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
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creator | GRUNER TORALF THIER MICHAEL HAUF MARKUS FOCHT GERHARD TAYEBATI PAYAM KAZI ARIF EVA ERIC SCHOENHOFF ULRICH FLUEGGE OLE SAUERHOEFER ALEXANDER WEBER JOCHEN |
description | The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods. |
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subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
title | Optical element and method |
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