Optical element and method

Optical element and method

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

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Bibliographische Detailangaben
Hauptverfasser: GRUNER TORALF, THIER MICHAEL, HAUF MARKUS, FOCHT GERHARD, TAYEBATI PAYAM, KAZI ARIF, EVA ERIC, SCHOENHOFF ULRICH, FLUEGGE OLE, SAUERHOEFER ALEXANDER, WEBER JOCHEN
Format: Patent
Sprache:eng
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Beschreibung
Zusammenfassung:The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.