Exposure apparatus, exposure method, and method for producing device

An immersion exposure apparatus includes an optical system via which the exposure beam exits, a first stage on which a substrate is placed and onto which the exposure beam is irradiated, and a second stage which is movable independently from the first stage. A liquid immersion system supplies a liqu...

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Bibliographische Detailangaben

1. Verfasser:	KIUCHI TOHRU
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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