Exposure apparatus, exposure method, and method for producing device

An immersion exposure apparatus includes an optical system via which the exposure beam exits, a first stage on which a substrate is placed and onto which the exposure beam is irradiated, and a second stage which is movable independently from the first stage. A liquid immersion system supplies a liqu...

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Bibliographische Detailangaben
1. Verfasser:	KIUCHI TOHRU
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion exposure apparatus includes an optical system via which the exposure beam exits, a first stage on which a substrate is placed and onto which the exposure beam is irradiated, and a second stage which is movable independently from the first stage. A liquid immersion system supplies a liquid beneath the optical system and forms a liquid immersion area. A bridge member provided on the first stage has an upper surface retaining the liquid immersion area between the upper surface and the optical system. A driving device moves the first stage and the bridge member relative to each other, and a driving system moves the first stage and the second stage so that a change is made from the liquid immersion area being retained between the optical system and the first stage to the liquid immersion area being retained between the optical system and the second stage.